• DocumentCode
    2315113
  • Title

    The potassium atom density distribution and plasma temperature profile in an MHD channel

  • Author

    Aoki, Y. ; Kitagawa, H. ; Sumi, K. ; Oikawa, S. ; Kayukawa, N. ; Yamazaki, H.

  • Author_Institution
    Hokkaido Univ., Sapporo, Japan
  • fYear
    1989
  • fDate
    0-0 1989
  • Firstpage
    67
  • Abstract
    Summary Form only given, as follows. The value of the natural damping ratio, a´, which is needed to calculate the density, N/sub k/, of potassium atoms in a magnetohydrodynamic plasma, has been determined experimentally. The choice of measurement frequency is discussed. The results showed that N/sub k/ in an ethyl-alcohol combustion plasma in which the potassium atom is 1 wt.% of the total components and at a temperature between 1700 and 2300 K is within the range 10/sup 22/-10/sup 23/ m/sup -3/. Since the total particle count in the combustion gas plasma is 3*10/sup 24/ approximately 4*10/sup 24/ m/sup -3/ in the above temperature range, the mol fraction of the potassium atoms as a percentage of the total components is 5*10/sup -3/ approximately 3*10/sup -2/. This value is much larger than the mol fraction of potassium atoms obtained under conditions of chemical reaction equilibrium. This is considered to be the chief cause of water drops during experiments and greatly influences the optical measurement of solid-state seed materials.<>
  • Keywords
    organic compounds; plasma density; plasma diagnostics; plasma magnetohydrodynamics; plasma temperature; 1700 to 2300 K; H/sub 2/O; H/sub 2/O drops; K atom density distribution; MHD channel; chemical reaction equilibrium; ethyl-alcohol combustion plasma; measurement frequency; natural damping ratio; optical measurement; plasma temperature profile; solid-state seed materials; total particle count; Magnetohydrodynamics; Organic compounds; Plasma measurements; Plasma properties; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
  • Conference_Location
    Buffalo, NY, USA
  • Type

    conf

  • DOI
    10.1109/PLASMA.1989.166040
  • Filename
    166040