Title :
Redox reaction imaging using THz chemical microscope
Author :
Minami, Yasuo ; Kiwa, Toshihiko ; Kawayama, Iwao ; Tonouchi, M. ; Tsukada, Keiji
Author_Institution :
Grad. Sch., Natural Sci. & Technol., Okayama Univ., Okayama, Japan
Abstract :
Terahertz chemical microscope was carried out to visualize the distribution of the redox reaction of the immobilized-enzyme. The urease films with the spot size of 3, 2, 1 mm in diameter were immobilized on a SiO2/Si/Sapphire layered device and the laser-excited terahertz radiation from the Si layer was observed, which can be related to the chemical potential shift of the SiO2 surface. The redox reaction between the urease and the urea solution was successfully measured.
Keywords :
biochemistry; biological techniques; enzymes; laser beam applications; oxidation; reduction (chemical); sapphire; silicon; silicon compounds; THz chemical microscope; chemical potential shift; immobilized-enzyme; laser-excited terahertz radiation; redox reaction imaging; urease film; Chemical lasers; Chemical technology; Cities and towns; Microscopy; Optical surface waves; Semiconductor device measurement; Semiconductor films; Substrates; Surface emitting lasers; Visualization;
Conference_Titel :
Infrared, Millimeter, and Terahertz Waves, 2009. IRMMW-THz 2009. 34th International Conference on
Conference_Location :
Busan
Print_ISBN :
978-1-4244-5416-7
Electronic_ISBN :
978-1-4244-5417-4
DOI :
10.1109/ICIMW.2009.5324691
