Title :
Oxidation of AlInAs for current blocking in a photonic crystal laser
Author :
Zhang, R. ; van der Tol, J.J.G.M. ; Ambrosius, H. ; Thijs, P. ; Smalbrugge, B. ; de Vries, T. ; Roelkens, G. ; Bordas, F. ; Smit, M.K.
Author_Institution :
COBRA Res. Inst., Tech. Univ. Eindhoven, Eindhoven, Netherlands
Abstract :
To make an electrically pumped photonic crystal membrane laser is a challenging task. One of the problems is how to avoid short circuiting between the p- and n-doped parts of the laser diode, when the membrane thickness is limited to 200-300nm. We propose to use the oxide of AlInAs to realize a current blocking function. In this way, based on submicron selective area re-growth, we aim for electrically injected photonic crystal lasers with high output power, small threshold currents and low power consumption. Here results are presented on the oxidation of AlInAs. The results show that it is feasible to use the oxide of AlInAs for current blocking in an InP-based membrane photonic crystal laser.
Keywords :
III-V semiconductors; aluminium compounds; indium compounds; laser cavity resonators; optical pumping; oxidation; photonic crystals; power consumption; semiconductor lasers; short-circuit currents; surface emitting lasers; AlInAs; current blocking; electrically injected photonic crystal lasers; electrically pumped photonic crystal membrane laser; laser diode; n-doping; oxidation; p-doping; power consumption; short circuiting; size 200 nm to 300 nm; submicron selective area re-growth; threshold currents; Indium phosphide; Laser excitation; Photonics; Pump lasers;
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices (COMMAD), 2010 Conference on
Conference_Location :
Canberra, ACT
Print_ISBN :
978-1-4244-7334-2
Electronic_ISBN :
1097-2137
DOI :
10.1109/COMMAD.2010.5699799