Title :
Directly UV-written planar channel waveguides containing simultaneously defined Bragg gratings
Author :
Emmerson, G. ; Watts, S. ; Gawith, C. ; Riziotis, C. ; Fu, A. ; Williams, R. ; Smith, P. ; Albanis, V. ; Ibsen, M.
Author_Institution :
Optoelectron. Res. Centre, Southampton, UK
Abstract :
A new technique for the simultaneous writing of channels and Bragg gratings uses interfering focused UV beams in a photosensitive silica layer and is able to fabricate near-ideal Bragg gratings, with 60% reflectivity.
Keywords :
Bragg gratings; optical planar waveguides; reflectivity; silicon compounds; ultraviolet lithography; Bragg grating fabrication; SiO2; directly UV-written planar channel waveguides; photosensitive silica layer; reflectivity; Bragg gratings; Optical devices; Optical materials; Optical planar waveguides; Optical refraction; Optical waveguides; Planar waveguides; Polymers; Propagation losses; Writing;
Conference_Titel :
Optical Fiber Communications Conference, 2003. OFC 2003
Print_ISBN :
1-55752-746-6
DOI :
10.1109/OFC.2003.1247491
