• DocumentCode
    2318414
  • Title

    Silicon-FET-based field emission devices

  • Author

    Kanemaru, Seigo ; Itoh, Junji

  • Author_Institution
    Electrotech. Lab., Ibaraki, Japan
  • fYear
    1998
  • fDate
    19-24 July 1998
  • Firstpage
    80
  • Lastpage
    81
  • Abstract
    The stability and controllability of field emission currents is an important issue in applications such as a field emission display. It is well known that the Fowler-Nordheim field emission is very sensitive to the work function of the emitter surface and the nano-meter structure of the emitter. The difficult control of these values brings the problem of the instability and non-uniformity of emission currents in field emitter arrays (FEAs). Spindt-type FEAs fabricated on glass substrates incorporate a resistive layer to improve the uniformity of the emission. An active device such as a field-effect-transistor (FET) is more effective for the improvement of the uniformity and stability. The gate of the FET can control the amount of emission current. Several researchers have reported the results of FET-controlled emitters, however, the fabrication process becomes complicated due to the additional process of the integration of FETs and FEAs.
  • Keywords
    MOSFET; electron field emission; elemental semiconductors; field emission displays; silicon; stability; vacuum microelectronics; FEA; FED; Fowler-Nordheim field emission; MOSFET-controlled emitters; Si; Si FET-based field emission devices; active device; controllability; fabrication process; field emission currents; field emission display; field emitter arrays; field-effect-transistor; instability; nanometer structure; stability; work function; Controllability; Electron emission; FETs; Fabrication; Field emitter arrays; Laboratories; MOSFET circuits; Silicon; Stability; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1998. Eleventh International
  • Conference_Location
    Asheville, NC, USA
  • Print_ISBN
    0-7803-5096-0
  • Type

    conf

  • DOI
    10.1109/IVMC.1998.728649
  • Filename
    728649