DocumentCode
2318414
Title
Silicon-FET-based field emission devices
Author
Kanemaru, Seigo ; Itoh, Junji
Author_Institution
Electrotech. Lab., Ibaraki, Japan
fYear
1998
fDate
19-24 July 1998
Firstpage
80
Lastpage
81
Abstract
The stability and controllability of field emission currents is an important issue in applications such as a field emission display. It is well known that the Fowler-Nordheim field emission is very sensitive to the work function of the emitter surface and the nano-meter structure of the emitter. The difficult control of these values brings the problem of the instability and non-uniformity of emission currents in field emitter arrays (FEAs). Spindt-type FEAs fabricated on glass substrates incorporate a resistive layer to improve the uniformity of the emission. An active device such as a field-effect-transistor (FET) is more effective for the improvement of the uniformity and stability. The gate of the FET can control the amount of emission current. Several researchers have reported the results of FET-controlled emitters, however, the fabrication process becomes complicated due to the additional process of the integration of FETs and FEAs.
Keywords
MOSFET; electron field emission; elemental semiconductors; field emission displays; silicon; stability; vacuum microelectronics; FEA; FED; Fowler-Nordheim field emission; MOSFET-controlled emitters; Si; Si FET-based field emission devices; active device; controllability; fabrication process; field emission currents; field emission display; field emitter arrays; field-effect-transistor; instability; nanometer structure; stability; work function; Controllability; Electron emission; FETs; Fabrication; Field emitter arrays; Laboratories; MOSFET circuits; Silicon; Stability; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location
Asheville, NC, USA
Print_ISBN
0-7803-5096-0
Type
conf
DOI
10.1109/IVMC.1998.728649
Filename
728649
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