DocumentCode :
2318658
Title :
Improving on-wafer measurements with membrane-technology-based calibration standards
Author :
Arz, Uwe ; Rohland, Martina ; Büttgenbach, Stephanus
Author_Institution :
Phys.-Tech. Bundesanstalt, Braunschweig, Germany
fYear :
2010
fDate :
Nov. 30 2010-Dec. 3 2010
Firstpage :
1
Lastpage :
7
Abstract :
In this paper we discuss the advantages of on-wafer calibration standards fabricated in membrane technology in comparison to standards built in conventional thin-film technology. Based on Monte Carlo simulations we investigate the propagation of uncertainties in the geometry and material properties to the broadband electrical properties of the standards. For coplanar waveguides used as line standards we demonstrate that, depending on the electromagnetic waveguide property we look at, an up to tenfold reduction in uncertainty can be achieved.
Keywords :
Monte Carlo methods; calibration; coplanar waveguides; electromagnetic wave propagation; Monte Carlo simulations; broadband electrical properties; coplanar waveguides; electromagnetic waveguide property; line standards; material properties; membrane technology-based calibration standards; on-wafer measurements; thin-film technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Measurement Symposium (ARFTG), 2010 76th ARFTG
Conference_Location :
Clearwater Beach, FL
Print_ISBN :
978-1-4244-7447-9
Type :
conf
DOI :
10.1109/ARFTG76.2010.5700065
Filename :
5700065
Link To Document :
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