• DocumentCode
    2318658
  • Title

    Improving on-wafer measurements with membrane-technology-based calibration standards

  • Author

    Arz, Uwe ; Rohland, Martina ; Büttgenbach, Stephanus

  • Author_Institution
    Phys.-Tech. Bundesanstalt, Braunschweig, Germany
  • fYear
    2010
  • fDate
    Nov. 30 2010-Dec. 3 2010
  • Firstpage
    1
  • Lastpage
    7
  • Abstract
    In this paper we discuss the advantages of on-wafer calibration standards fabricated in membrane technology in comparison to standards built in conventional thin-film technology. Based on Monte Carlo simulations we investigate the propagation of uncertainties in the geometry and material properties to the broadband electrical properties of the standards. For coplanar waveguides used as line standards we demonstrate that, depending on the electromagnetic waveguide property we look at, an up to tenfold reduction in uncertainty can be achieved.
  • Keywords
    Monte Carlo methods; calibration; coplanar waveguides; electromagnetic wave propagation; Monte Carlo simulations; broadband electrical properties; coplanar waveguides; electromagnetic waveguide property; line standards; material properties; membrane technology-based calibration standards; on-wafer measurements; thin-film technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Measurement Symposium (ARFTG), 2010 76th ARFTG
  • Conference_Location
    Clearwater Beach, FL
  • Print_ISBN
    978-1-4244-7447-9
  • Type

    conf

  • DOI
    10.1109/ARFTG76.2010.5700065
  • Filename
    5700065