DocumentCode
2318658
Title
Improving on-wafer measurements with membrane-technology-based calibration standards
Author
Arz, Uwe ; Rohland, Martina ; Büttgenbach, Stephanus
Author_Institution
Phys.-Tech. Bundesanstalt, Braunschweig, Germany
fYear
2010
fDate
Nov. 30 2010-Dec. 3 2010
Firstpage
1
Lastpage
7
Abstract
In this paper we discuss the advantages of on-wafer calibration standards fabricated in membrane technology in comparison to standards built in conventional thin-film technology. Based on Monte Carlo simulations we investigate the propagation of uncertainties in the geometry and material properties to the broadband electrical properties of the standards. For coplanar waveguides used as line standards we demonstrate that, depending on the electromagnetic waveguide property we look at, an up to tenfold reduction in uncertainty can be achieved.
Keywords
Monte Carlo methods; calibration; coplanar waveguides; electromagnetic wave propagation; Monte Carlo simulations; broadband electrical properties; coplanar waveguides; electromagnetic waveguide property; line standards; material properties; membrane technology-based calibration standards; on-wafer measurements; thin-film technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Measurement Symposium (ARFTG), 2010 76th ARFTG
Conference_Location
Clearwater Beach, FL
Print_ISBN
978-1-4244-7447-9
Type
conf
DOI
10.1109/ARFTG76.2010.5700065
Filename
5700065
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