DocumentCode :
2318919
Title :
Low voltage operation from Tower structure MOSFET Si field emitter
Author :
Koga, Keisuke ; Kanemaru, Seigo ; Itoh, Junji
Author_Institution :
Matsushita Electr. Ind. Co. Ltd., Moriguchi, Japan
fYear :
1998
fDate :
19-24 July 1998
Firstpage :
126
Lastpage :
127
Abstract :
Silicon field emitter arrays are expected to be a key technology for realizing high performance FED in the next generation. The most important factors of FED for practical application, such as PDAs, are extremely low power consumption besides the emission stability. Recently, it has been reported that an active device utilizing MOSFET can control the emission current. However, the emission property including device reliability has not been studied in detail. This paper is a first report on the device reliability analysis concerned with a hot electron effect, and on the optimization of MOSFET structure.
Keywords :
MOSFET; electron field emission; elemental semiconductors; hot carriers; low-power electronics; semiconductor device reliability; silicon; vacuum microelectronics; Si; Tower structure MOSFET; active device; hot electron effect; low voltage operation; reliability; silicon field emitter array; Field emitter arrays; Impact ionization; Laboratories; Low voltage; MOSFET circuits; Personal digital assistants; Poles and towers; Silicon; Stability; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location :
Asheville, NC, USA
Print_ISBN :
0-7803-5096-0
Type :
conf
DOI :
10.1109/IVMC.1998.728674
Filename :
728674
Link To Document :
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