DocumentCode
2318945
Title
100 nm gate aperture field emitter arrays
Author
Pflug, David G. ; Schattenburg, Mark ; Akinwande, Akintunde I. ; Smith, Henry I.
Author_Institution
MIT, Cambridge, MA, USA
fYear
1998
fDate
19-24 July 1998
Firstpage
130
Lastpage
131
Abstract
We report the results of experimental and numerical simulation studies of the scaling of FEA gate apertures. Numerical simulation of "realistic" device structures was performed using a commercially available electrostatic simulator and custom written software. Our device simulations indicate that FEAs will operate with a gate to emitter voltage below 15 V if the gate aperture is scaled to 100 nm. At this operating voltage the FEA can provide an array current density of at least 10 /spl mu/A/cm/sup 2/ which should be adequate for use in a notebook computer type flat panel display.
Keywords
electron field emission; vacuum microelectronics; 100 nm; 15 V; current density; custom software; electrostatic simulator; field emitter array; gate aperture scaling; numerical simulation; Anodes; Apertures; Current density; Electrostatic measurements; Field emitter arrays; Flat panel displays; Geometry; Numerical simulation; Resists; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location
Asheville, NC, USA
Print_ISBN
0-7803-5096-0
Type
conf
DOI
10.1109/IVMC.1998.728676
Filename
728676
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