• DocumentCode
    2318945
  • Title

    100 nm gate aperture field emitter arrays

  • Author

    Pflug, David G. ; Schattenburg, Mark ; Akinwande, Akintunde I. ; Smith, Henry I.

  • Author_Institution
    MIT, Cambridge, MA, USA
  • fYear
    1998
  • fDate
    19-24 July 1998
  • Firstpage
    130
  • Lastpage
    131
  • Abstract
    We report the results of experimental and numerical simulation studies of the scaling of FEA gate apertures. Numerical simulation of "realistic" device structures was performed using a commercially available electrostatic simulator and custom written software. Our device simulations indicate that FEAs will operate with a gate to emitter voltage below 15 V if the gate aperture is scaled to 100 nm. At this operating voltage the FEA can provide an array current density of at least 10 /spl mu/A/cm/sup 2/ which should be adequate for use in a notebook computer type flat panel display.
  • Keywords
    electron field emission; vacuum microelectronics; 100 nm; 15 V; current density; custom software; electrostatic simulator; field emitter array; gate aperture scaling; numerical simulation; Anodes; Apertures; Current density; Electrostatic measurements; Field emitter arrays; Flat panel displays; Geometry; Numerical simulation; Resists; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1998. Eleventh International
  • Conference_Location
    Asheville, NC, USA
  • Print_ISBN
    0-7803-5096-0
  • Type

    conf

  • DOI
    10.1109/IVMC.1998.728676
  • Filename
    728676