Title :
Adsorption of fluorine compound to the carbon surfaces and design of lubricant
Author :
Kondo, Hirofumi ; Nishida, Yasuyo
Author_Institution :
Magnetic Media R & D Dept., Sony Corp. Core Technol. & Network Co., Tagajo, Japan
Abstract :
Chemical analysis of the actual carbon surface was investigated by surface modification technique using fluorine compound prior to XPS measurements. The number of surface groups was obtained from the ratio of the fluorine and carbon in the XPS spectrum. Hydroxyl group is rich immediately after deposition but carbonyl concentration increases with exposure time. Adsorption of lube depends on the chemical composition of the functional groups. The FTIR spectra of the fluorinated compound film employed reveal the molecular orientation in the film. The weakly interacted lubricant has a random orientation and higher friction, however, friction is low for the strongly adsorbed lubricant to the surface with high orientation. Based on the chemical analysis and film orientation the newly synthesized lubricant has a good friction performance.
Keywords :
Fourier transform spectroscopy; X-ray photoelectron spectra; adsorption; chemical analysis; diamond-like carbon; friction; hard discs; infrared spectroscopy; lubrication; protective coatings; C; FTIR spectra; XPS; adsorption; carbon surfaces; carbonyl concentration; chemical analysis; diamond like carbon; exposure time; fluorine compound; friction performance; functional groups; head-media interactions; hydroxyl group; lubricant; magnetic layer; molecular orientation; protective layer; random orientation; recording media; rotating disks; storage density; surface modification technique; weakly interacted lubricant; Carbon compounds; Chemical analysis; Chemical vapor deposition; Diamond-like carbon; Friction; Lubricants; Magnetic films; Magnetic recording; Spectroscopy; Surface contamination;
Conference_Titel :
Magnetic Recording Conference, 2002. Digest of the Asia-Pacific
Conference_Location :
Singapore
Print_ISBN :
0-7803-7509-2
DOI :
10.1109/APMRC.2002.1037640