DocumentCode
2319258
Title
A theoretical study of field emission from p-type diamond films
Author
Huang, Qing-An ; Qin, Ming ; Zhang, Bin ; Zheng, Qi-Jing
Author_Institution
Microelectron. Center, Southeast Univ., Nanjing, China
fYear
1998
fDate
19-24 July 1998
Firstpage
164
Lastpage
165
Abstract
In order to take advantage of the negative electron affinity (NEA) of diamond for low field electron emission, the Fermi level must be as high up in the band gap as possible. This could be achieved by doping the diamond with n-type dopants. But, unfortunately, reliable n-type doping has been difficult. Generally p-type semiconducting diamond is readily available. The low-field emission from p-type diamond has been experimentally observed. In theory, however, mechanisms for field emission from p-type diamond films have not well been understood. In this paper, a model has been developed which takes the NEA, band bending, impurity/defect ionization into account. The theoretical results can be used to explain the low-field emission and the weak temperature dependence of field emission from the p-type diamond films.
Keywords
diamond; electron affinity; electron field emission; elemental semiconductors; semiconductor thin films; C; Fermi level; band bending; defect ionization; doped semiconductor; field emission; impurity ionization; negative electron affinity; p-type diamond film; Charge carrier processes; Effective mass; Electron emission; Hydrogen; Microelectronics; Photonic band gap; Semiconductivity; Semiconductor device doping; Semiconductor films; Semiconductor process modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location
Asheville, NC, USA
Print_ISBN
0-7803-5096-0
Type
conf
DOI
10.1109/IVMC.1998.728694
Filename
728694
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