• DocumentCode
    2319271
  • Title

    A new self-aligned-gate-molding technique for the fabrication of gated diamond emitter

  • Author

    Kang, W.P. ; Wisitsora-at, A. ; Davidson, J.L. ; Li, Q. ; Xu, J.F. ; Kerns, D.V.

  • Author_Institution
    Dept. of Electr. Eng., Vanderbilt Univ., Nashville, TN, USA
  • fYear
    1998
  • fDate
    19-24 July 1998
  • Firstpage
    168
  • Lastpage
    169
  • Abstract
    We have developed micro-patterned pyramidal diamond microtips on diamond film and have reported a gated diamond field emitter fabricated by a "conventional" self-aligning technique. In this paper, we report the development of a new self-align fabrication process "self-align-gate-molding" technique for the fabrication of an ultra sharp diamond field emitter with self-aligned anode achieving a sub-volt (0.7 V) turn on voltage and high and stable emission current. The new self-align fabrication technique is much simpler than the convention self-align technique. Moreover, the new fabrication method produces an ultra sharp diamond tip, which needs no further tip sharpening after tip formation. This improves the field enhancement factor of the diamond tips, thereby reducing the operating voltage and enhancing emission current compared to diamond tips fabricated by the conventional molding technique. This results in a more uniform self-align gated structure with a sharper diamond tip apex and a more economical fabrication process.
  • Keywords
    diamond; electron field emission; moulding; vacuum microelectronics; C; diamond film; fabrication; gated diamond field emitter; micropatterned pyramidal diamond microtip; self-aligned-gate-molding; Anisotropic magnetoresistance; Anodes; Dielectrics; Diodes; Etching; Fabrication; Lithography; Oxidation; Silicon compounds; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1998. Eleventh International
  • Conference_Location
    Asheville, NC, USA
  • Print_ISBN
    0-7803-5096-0
  • Type

    conf

  • DOI
    10.1109/IVMC.1998.728696
  • Filename
    728696