DocumentCode :
2319415
Title :
Elucidation of field emission characteristics of phosphorus-doped diamond films
Author :
Kuriyama, Kenji ; Kimura, Chiham ; Sugino, Takashi
Author_Institution :
Dept. of Electr. Eng., Osaka Univ., Japan
fYear :
1998
fDate :
19-24 July 1998
Firstpage :
180
Lastpage :
181
Abstract :
There is much interest in studies on field emission of diamond films because diamond has not only superior properties such as chemical inertness and mechanical hardness but also negative electron affinity (NEA) on the surface terminated with hydrogen atoms. However, the mechanism of electron emission from diamond films has not been clear yet. Therefore, it is necessary to understand it. Phosphorus (P) is one of the most promising candidates as a donor impurity in order to synthesize low-resistive n-type diamond films. Theoretical and experimental P donor levels are 0.2 and 0.43 eV, respectively, from the conduction band edge of diamond films. It is expected that the Fermi level moves toward the conduction band edge by P doping and also that the electric field at the P-doped diamond/metal contacts is enhanced because of forming the space charge layer due to ionized donors.
Keywords :
diamond; electron field emission; phosphorus; thin films; C:P; donor impurity; field emission; phosphorus doped diamond film; Chemical vapor deposition; Electron emission; Gold; Low voltage; Plasma measurements; Plasma temperature; Semiconductor films; Substrates; Temperature dependence; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location :
Asheville, NC, USA
Print_ISBN :
0-7803-5096-0
Type :
conf
DOI :
10.1109/IVMC.1998.728704
Filename :
728704
Link To Document :
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