DocumentCode
2319415
Title
Elucidation of field emission characteristics of phosphorus-doped diamond films
Author
Kuriyama, Kenji ; Kimura, Chiham ; Sugino, Takashi
Author_Institution
Dept. of Electr. Eng., Osaka Univ., Japan
fYear
1998
fDate
19-24 July 1998
Firstpage
180
Lastpage
181
Abstract
There is much interest in studies on field emission of diamond films because diamond has not only superior properties such as chemical inertness and mechanical hardness but also negative electron affinity (NEA) on the surface terminated with hydrogen atoms. However, the mechanism of electron emission from diamond films has not been clear yet. Therefore, it is necessary to understand it. Phosphorus (P) is one of the most promising candidates as a donor impurity in order to synthesize low-resistive n-type diamond films. Theoretical and experimental P donor levels are 0.2 and 0.43 eV, respectively, from the conduction band edge of diamond films. It is expected that the Fermi level moves toward the conduction band edge by P doping and also that the electric field at the P-doped diamond/metal contacts is enhanced because of forming the space charge layer due to ionized donors.
Keywords
diamond; electron field emission; phosphorus; thin films; C:P; donor impurity; field emission; phosphorus doped diamond film; Chemical vapor deposition; Electron emission; Gold; Low voltage; Plasma measurements; Plasma temperature; Semiconductor films; Substrates; Temperature dependence; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location
Asheville, NC, USA
Print_ISBN
0-7803-5096-0
Type
conf
DOI
10.1109/IVMC.1998.728704
Filename
728704
Link To Document