• DocumentCode
    2319415
  • Title

    Elucidation of field emission characteristics of phosphorus-doped diamond films

  • Author

    Kuriyama, Kenji ; Kimura, Chiham ; Sugino, Takashi

  • Author_Institution
    Dept. of Electr. Eng., Osaka Univ., Japan
  • fYear
    1998
  • fDate
    19-24 July 1998
  • Firstpage
    180
  • Lastpage
    181
  • Abstract
    There is much interest in studies on field emission of diamond films because diamond has not only superior properties such as chemical inertness and mechanical hardness but also negative electron affinity (NEA) on the surface terminated with hydrogen atoms. However, the mechanism of electron emission from diamond films has not been clear yet. Therefore, it is necessary to understand it. Phosphorus (P) is one of the most promising candidates as a donor impurity in order to synthesize low-resistive n-type diamond films. Theoretical and experimental P donor levels are 0.2 and 0.43 eV, respectively, from the conduction band edge of diamond films. It is expected that the Fermi level moves toward the conduction band edge by P doping and also that the electric field at the P-doped diamond/metal contacts is enhanced because of forming the space charge layer due to ionized donors.
  • Keywords
    diamond; electron field emission; phosphorus; thin films; C:P; donor impurity; field emission; phosphorus doped diamond film; Chemical vapor deposition; Electron emission; Gold; Low voltage; Plasma measurements; Plasma temperature; Semiconductor films; Substrates; Temperature dependence; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1998. Eleventh International
  • Conference_Location
    Asheville, NC, USA
  • Print_ISBN
    0-7803-5096-0
  • Type

    conf

  • DOI
    10.1109/IVMC.1998.728704
  • Filename
    728704