The performance of thin film carbon materials and carbon nanotubes as cold cathodes

Author

Amaratunga, A.J. ; Baxendale, M. ; Rupasinghe, N. ; Munindradasa, D.A.I. ; Chhowalla, M. ; Butler, T.

Author_Institution

Dept. of Electr. Eng. & Electron., Liverpool Univ., UK

fYear

1998

fDate

19-24 July 1998

Firstpage

184

Lastpage

185

Abstract

In this work we have studied the field emission from three different types of carbon films: (i) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at%. (ii) Cathodic arc deposited tetrahedral amorphous carbon (ta-C) with embedded regions of carbon nanotube and onion structures. (iii) Unoriented carbon nanotube films on a porous substrate. These films were formed by filtering a solution of nanotubes dispersed in alcohol through the pores (0.2 um dia.) and drying.

Keywords

carbon; carbon nanotubes; cathodes; electron field emission; plasma CVD coatings; C; C:H,N; RF PECVD; carbon nanotube; carbon thin film; cathodic arc deposition; cold cathode; field emission; nitrogen doped amorphous carbon; onion structure; tetrahedral amorphous carbon; Amorphous materials; Carbon dioxide; Carbon nanotubes; Cathodes; Iron; Nanoparticles; Optical films; Organic materials; Semiconductor films; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 1998. Eleventh International

Conference_Location

Asheville, NC, USA

Print_ISBN

0-7803-5096-0

Type

conf

DOI

10.1109/IVMC.1998.728707

Filename

728707