DocumentCode
2319526
Title
Micromachining for sub-10nm flying height sliders
Author
Mingsheng Zhang ; Gonzaga, L. ; Yuet Sim Hor ; Bo Liu
Author_Institution
Data Storage Institute
fYear
2002
fDate
27-29 Aug. 2002
Abstract
The key slider fabrication processes such as roughness control on the ABS, curvature control and adjustment on the ABS, pole-tip recession (PTR) control and ICP reactive ion etching of AlTiC with CF4 are discussed in this paper. The optimized process results and the fabricated pic0 and femto sliders with 6 nm flying height are presented.
Keywords
Dry etching; Fabrication; Micromachining; Rough surfaces; Stress control; Surface charging; Surface roughness; Ultrafast electronics;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetic Recording Conference, 2002. Digest of the Asia-Pacific
Conference_Location
Singapore
Print_ISBN
0-7803-7509-2
Type
conf
DOI
10.1109/APMRC.2002.1037666
Filename
1037666
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