DocumentCode
2320016
Title
Examination of electron field emission efficiency and homogeneity from CVD carbon-type films
Author
Biyablin, A.A. ; Kandidov, A.V. ; Pilevskiy, A.A. ; Rakhimov, A.T. ; Samorodov, V.A. ; Seleznev, B.V. ; Suetin, N.V. ; Timofeyev, M.A.
Author_Institution
Inst. of Nucl. Phys., Moscow State Univ., Russia
fYear
1998
fDate
19-24 July 1998
Firstpage
234
Lastpage
235
Abstract
This paper reports about investigation of electron emission characteristics of carbon-type films grown by an original CVD method on Si and Mo substrates with the diameter 30 mm. It was shown that films have sufficiently high spatial uniformity of emission sites and emission current density exceeds 900 mA/cm/sup 2/ at the extraction field around 7 V/micron.
Keywords
CVD coatings; carbon; electron field emission; C; CVD carbon-type films; electron emission characteristics; electron field emission efficiency; emission current density; emission sites; high spatial uniformity; homogeneity; Cathodes; Charge coupled devices; Current density; Displays; Electron emission; Fabrication; Nuclear physics; Phosphors; Pulsed power supplies; Semiconductor films;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location
Asheville, NC, USA
Print_ISBN
0-7803-5096-0
Type
conf
DOI
10.1109/IVMC.1998.728735
Filename
728735
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