DocumentCode
2320044
Title
The influence of ECR MW plasma deposition conditions on the microstructure and morphology of diamond like carbon films
Author
Gulyaev, Yu.V. ; Suzdaltsev, S. Yu ; Sysuev, S.V. ; Yafarov, R.K.
Author_Institution
Inst. of Radio Eng. & Electron., Acad. of Sci., Saratov, Russia
fYear
1998
fDate
19-24 July 1998
Firstpage
238
Lastpage
241
Abstract
This paper is aimed at searching technological conditions for the production of film materials with different allotropic carbon phases and a highly nanhomogeneous surface to lower the field emission voltages of diamond-like carbon films. The investigation results are promising for the development of production methods for low-field-emission to fabricate flat displays, as well as other vacuum microelectronics devices.
Keywords
carbon; crystal microstructure; crystal morphology; plasma CVD coatings; C; ECR MW plasma deposition conditions; allotropic carbon phases; diamond like carbon films; field emission voltages; flat displays; highly nonhomogeneous surface; microstructure; morphology; vacuum microelectronics devices; Carbon dioxide; Diamond-like carbon; Flat panel displays; Microscopy; Microstructure; Plasma temperature; Polymer films; Production; Substrates; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location
Asheville, NC, USA
Print_ISBN
0-7803-5096-0
Type
conf
DOI
10.1109/IVMC.1998.728737
Filename
728737
Link To Document