Title :
Field emission from nano-crystallite diamond films
Author :
Binglin Zhang ; Yao, Ning ; Li, Yunjun ; Bi, Zhaoqi ; Wang, Xiaoping
Author_Institution :
Phys. Dept., Zhengzhou Univ., Henan, China
Abstract :
Field electron emission from nano-crystallite diamond films, which were prepared on Mo deposited ceramic substrate by microwave plasma enhanced chemical vapor deposition (CVD), has been investigated. The nanostructure of the films has been identified by using X-ray diffraction (XRD), scanning electron microscope (SEM) and Raman spectrum. The X-ray diffraction spectrum of the films shows the broad peak of the diamond [111] facet. The nano-structure of the films has been observed by SEM. Raman spectrum of the film shows a broad peak at 1332 cm/sup -1/ and the other bread peak at 1580 cm/sup -1/. The field emission experiment has been performed in a vacuum system with a base pressure of about 10/sup -7/ Torr. The turn-on field is below 2.4 V//spl mu/m. The current density of 4 mA/cm/sup 2/ and the emission sites density of 10/sup 3//cm/sup 2/ at electric field of 10 V//spl mu/m were obtained.
Keywords :
Raman spectra; X-ray diffraction; diamond; electron field emission; nanostructured materials; plasma CVD coatings; scanning electron microscopy; C; Raman spectrum; X-ray diffraction; field electron emission; microwave plasma enhanced chemical vapor deposition; nanocrystallite diamond film; nanostructure; scanning electron microscopy; Ceramics; Chemical vapor deposition; Electron emission; Plasma chemistry; Plasma x-ray sources; Scanning electron microscopy; Substrates; Vacuum systems; X-ray diffraction; X-ray scattering;
Conference_Titel :
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location :
Asheville, NC, USA
Print_ISBN :
0-7803-5096-0
DOI :
10.1109/IVMC.1998.728739
