DocumentCode
2320123
Title
Field emission from diamond-like carbon films
Author
Zhang, Binglin ; Yao, Ning ; Li, Yunjun ; Bi, Zhaoqi ; Wang, Xiaoping
Author_Institution
Dept. of Phys., Zhengzhou Univ., Henan, China
fYear
1998
fDate
19-24 July 1998
Firstpage
246
Lastpage
247
Abstract
A low turn-on field electron emission from diamond-like carbon films has been observed for the first time to author´s knowledge. Carbon films were prepared by microwave plasma chemical vapor deposition(CVD). Special pretreatment ceramic substrates were used. The characteristics of the film have been identified by using X-ray diffraction (XRD), and Raman spectrum. The field emission experiment has been performed in a vacuum chamber with a base pressure of about 10/sup -5/ Pa. The turn-on field of 1.2 V//spl mu/m, and the current density of 1.25 mA/cm/sup 2/ at electric field of 6 V//spl mu/m were obtained.
Keywords
Raman spectra; X-ray diffraction; carbon; electron field emission; plasma CVD coatings; C; Raman spectrum; X-ray diffraction; diamond-like carbon film; field emission; microwave plasma chemical vapor deposition; Carbon dioxide; Ceramics; Chemicals; Diamond-like carbon; Electron emission; Plasma chemistry; Plasma properties; Plasma x-ray sources; Substrates; X-ray diffraction;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location
Asheville, NC, USA
Print_ISBN
0-7803-5096-0
Type
conf
DOI
10.1109/IVMC.1998.728740
Filename
728740
Link To Document