DocumentCode
2320135
Title
Field emission characteristics of diamond films with different surface morphologies
Author
Ji, H. ; Jin, Z.S. ; W, J.Y. ; Lu, X.Y. ; Liu, B.B. ; Jin, W.C. ; Yuan, G. ; Jin, Z.S.
Author_Institution
Nat. Key Lab. of Superhard Mater., Jilin Univ., Changchun, China
fYear
1998
fDate
19-24 July 1998
Firstpage
248
Lastpage
249
Abstract
In recent years, field emission from diamond films has attracted a lot of attention because of the excellent physical and chemical properties of diamond. The emission property of diamond is influenced by defect, doping and surface state et al, surface state of diamond is very important aspect. In this work, we carried out an experiment and analytical study of field emission from diamond with various crystal grain size and orientation produced by chemical vapor deposition (CVD).
Keywords
CVD coatings; crystal orientation; diamond; electron field emission; grain size; surface structure; C; chemical vapor deposition; crystal orientation; diamond film; field emission; grain size; surface morphology; Chemical analysis; Chemical vapor deposition; Doping; Grain boundaries; Grain size; Low voltage; Physics; Plasma chemistry; Semiconductor films; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location
Asheville, NC, USA
Print_ISBN
0-7803-5096-0
Type
conf
DOI
10.1109/IVMC.1998.728741
Filename
728741
Link To Document