DocumentCode :
2320135
Title :
Field emission characteristics of diamond films with different surface morphologies
Author :
Ji, H. ; Jin, Z.S. ; W, J.Y. ; Lu, X.Y. ; Liu, B.B. ; Jin, W.C. ; Yuan, G. ; Jin, Z.S.
Author_Institution :
Nat. Key Lab. of Superhard Mater., Jilin Univ., Changchun, China
fYear :
1998
fDate :
19-24 July 1998
Firstpage :
248
Lastpage :
249
Abstract :
In recent years, field emission from diamond films has attracted a lot of attention because of the excellent physical and chemical properties of diamond. The emission property of diamond is influenced by defect, doping and surface state et al, surface state of diamond is very important aspect. In this work, we carried out an experiment and analytical study of field emission from diamond with various crystal grain size and orientation produced by chemical vapor deposition (CVD).
Keywords :
CVD coatings; crystal orientation; diamond; electron field emission; grain size; surface structure; C; chemical vapor deposition; crystal orientation; diamond film; field emission; grain size; surface morphology; Chemical analysis; Chemical vapor deposition; Doping; Grain boundaries; Grain size; Low voltage; Physics; Plasma chemistry; Semiconductor films; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location :
Asheville, NC, USA
Print_ISBN :
0-7803-5096-0
Type :
conf
DOI :
10.1109/IVMC.1998.728741
Filename :
728741
Link To Document :
بازگشت