• DocumentCode
    2320231
  • Title

    A study on improved electron emission characteristics of micro-patterned DLC films

  • Author

    Shin, I.H. ; Lee, T.D.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea
  • fYear
    1998
  • fDate
    19-24 July 1998
  • Firstpage
    258
  • Lastpage
    262
  • Abstract
    DLC films have been grown on silicon substrates by pulsed Nd-YAG laser ablation using oscillating graphite target. Excellent field emission characteristics of the micro-patterned DLC films were obtained and columnar DLC structure showed high area density of emission sites and good field emission uniformity. These findings indicate that the patterned and particle-filtered DLC film has high potential as a cold cathode electron source for field emission display. Also emission characteristics of the DLC film after annealing at high temperature will be discussed together with the analysis of Raman spectroscopy.
  • Keywords
    Raman spectra; annealing; carbon; electron field emission; pulsed laser deposition; C; DLC film; Raman spectroscopy; cold cathode; columnar structure; diamond-like carbon; field electron emission; field emission display; high temperature annealing; micro-patterning; oscillating graphite target; particle filtering; pulsed laser ablation; silicon substrate; Annealing; Cathodes; Electron emission; Electron sources; Flat panel displays; Laser ablation; Optical pulses; Semiconductor films; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1998. Eleventh International
  • Conference_Location
    Asheville, NC, USA
  • Print_ISBN
    0-7803-5096-0
  • Type

    conf

  • DOI
    10.1109/IVMC.1998.728746
  • Filename
    728746