DocumentCode :
2320231
Title :
A study on improved electron emission characteristics of micro-patterned DLC films
Author :
Shin, I.H. ; Lee, T.D.
Author_Institution :
Dept. of Mater. Sci. & Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea
fYear :
1998
fDate :
19-24 July 1998
Firstpage :
258
Lastpage :
262
Abstract :
DLC films have been grown on silicon substrates by pulsed Nd-YAG laser ablation using oscillating graphite target. Excellent field emission characteristics of the micro-patterned DLC films were obtained and columnar DLC structure showed high area density of emission sites and good field emission uniformity. These findings indicate that the patterned and particle-filtered DLC film has high potential as a cold cathode electron source for field emission display. Also emission characteristics of the DLC film after annealing at high temperature will be discussed together with the analysis of Raman spectroscopy.
Keywords :
Raman spectra; annealing; carbon; electron field emission; pulsed laser deposition; C; DLC film; Raman spectroscopy; cold cathode; columnar structure; diamond-like carbon; field electron emission; field emission display; high temperature annealing; micro-patterning; oscillating graphite target; particle filtering; pulsed laser ablation; silicon substrate; Annealing; Cathodes; Electron emission; Electron sources; Flat panel displays; Laser ablation; Optical pulses; Semiconductor films; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location :
Asheville, NC, USA
Print_ISBN :
0-7803-5096-0
Type :
conf
DOI :
10.1109/IVMC.1998.728746
Filename :
728746
Link To Document :
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