DocumentCode :
2320338
Title :
Lowering of the work function on carbon surfaces due to hydrogen plasma treatment
Author :
Ruffieux, P. ; Groening, O. ; Groening, P. ; Diederich, L. ; Kuettel, O. ; Schlapbach, L.
Author_Institution :
Physikinst., Forschungsguppe Festkoerperphys., Fribourg, Switzerland
fYear :
1998
fDate :
19-24 July 1998
Firstpage :
273
Lastpage :
274
Abstract :
It is known that exposure of smooth [111] and [100] diamond surfaces to atomic hydrogen leads to negative electron affinity. A common explanation is the assumption of a dipole layer leading to a reduction of the work function. However, it is not so clear whether such a dipole layer is beneficial for field electron emission. We investigated by STM, AFM, X-ray and ultraviolet photoelectron spectroscopy (XPS, UPS) the effect of a hydrogen plasma treatment on different carbon surfaces (HOPG, diamond, amorphous carbon).
Keywords :
carbon; electron affinity; electron field emission; plasma materials processing; surface treatment; work function; AFM; C; H; HOPG; STM; UPS; XPS; amorphous carbon; carbon surface; diamond; dipole layer; field electron emission; hydrogen plasma treatment; negative electron affinity; work function; Atomic layer deposition; Carbon dioxide; Diamond-like carbon; Electron emission; Hydrogen; Lead; Plasma x-ray sources; Spectroscopy; Surface treatment; Uninterruptible power systems;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location :
Asheville, NC, USA
Print_ISBN :
0-7803-5096-0
Type :
conf
DOI :
10.1109/IVMC.1998.728752
Filename :
728752
Link To Document :
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