• DocumentCode
    2320545
  • Title

    Fabrication and characterization of a GaAs field emission triode for low voltage operation at atmospheric pressure

  • Author

    Arslan, D. ; DasGupta, A. ; Flath, M. ; Hartnagel, H.L.

  • Author_Institution
    Inst. fur Hochfrequenztech., Tech. Univ. Darmstadt, Germany
  • fYear
    1998
  • fDate
    19-24 July 1998
  • Firstpage
    287
  • Lastpage
    288
  • Abstract
    We fabricated field emission triodes (FEMTs) consisting of wedge shaped cathodes and gates. The wedges have a high degree of geometrical reproducibility due to the chosen technology. The I-V characteristics of the devices was measured and demonstrated the principle function of FEMTs. The fabrication process of the presented devices is easy and reliable.
  • Keywords
    III-V semiconductors; electron field emission; gallium arsenide; low-power electronics; triodes; vacuum microelectronics; GaAs; GaAs field emission micro triode; I-V characteristics; atmospheric pressure; fabrication; low voltage operation; wedge shaped FEMT; Anodes; Cathodes; Electron sources; Etching; Fabrication; Gallium arsenide; Low voltage; Scanning electron microscopy; Solid modeling; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1998. Eleventh International
  • Conference_Location
    Asheville, NC, USA
  • Print_ISBN
    0-7803-5096-0
  • Type

    conf

  • DOI
    10.1109/IVMC.1998.728760
  • Filename
    728760