DocumentCode :
2320686
Title :
Thermal behavior of GaAs/AlGaAs quantum-cascade-lasers: effect of the Al content in the barrier layers
Author :
Ortiz, V. ; Page, H. ; Becker, C. ; Sirtori, C.
Author_Institution :
Thales Res. & Technol., Orsay, France
fYear :
2002
fDate :
15-20 Sept. 2002
Firstpage :
35
Lastpage :
36
Abstract :
Recently, room temperature (RT) operation of GaAs-based quantum cascade (QC) lasers emitting at /spl sim/9 /spl mu/m was obtained by increasing the Al content in the barrier material. This allowed a stronger electron confinement and the reduction of the thermally activated leakage processes. Today, these devices operate up to 60/spl deg/C. Here, we present an in-depth study of the influence of the Al content on the thermal behavior of QC lasers. Also, we present new designs of QC structures based on the possibility to change the Al content during the MBE growth.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; laser transitions; molecular beam epitaxial growth; quantum cascade lasers; thermo-optical effects; 60 degC; 9 micron; Al; Al content; GaAs-AlGaAs; GaAs-based quantum cascade lasers; GaAs/AlGaAs quantum-cascade-lasers; MBE growth; QC structures; barrier layers; barrier material; electron confinement; room temperature operation; thermal behavior; thermally activated leakage processes; Artificial intelligence; Composite materials; Electrons; Gallium arsenide; Impedance; Optical materials; Potential well; Quantum cascade lasers; Surface emitting lasers; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Molecular Beam Epitaxy, 2002 International Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-7581-5
Type :
conf
DOI :
10.1109/MBE.2002.1037747
Filename :
1037747
Link To Document :
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