Title :
Numerical Modeling Of An ECR Ion Source
Author :
Grotjohn, T. ; Tan, W.-Y.
Author_Institution :
Michigan State University
Keywords :
Electrons; Ion sources; Numerical models; Plasma applications; Plasma density; Plasma materials processing; Plasma sheaths; Plasma simulation; Plasma sources; Poisson equations;
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
DOI :
10.1109/PLASMA.1991.695676
