DocumentCode :
2321732
Title :
VO2 thin films for micromanipulators
Author :
Ramsey, C. ; Cabrera, Rafmag ; Merced, Emmanuelle ; Sepulveda, Nelson
Author_Institution :
Dept. of Electr. & Comput. Eng., Michigan State Univ., East Lansing, MI, USA
fYear :
2012
fDate :
16-19 Oct. 2012
Firstpage :
120
Lastpage :
123
Abstract :
The use of VO2 thin films as the active element in micromanipulators of multiple degrees of freedom is studied. It is shown that the insulator-to-metal transition of VO2, which occurs at around 68°C, can be used to create localized stress gradients in micro-structures. By controlling the location and intensity of these stress gradients, precise and multiple inflection points within a cantilever beamcan be achieved. This transition can be induced locally by any form of heating. In this work the transition is induced by optical radiation which allows remote actuation of the micromanipulators. Due to the relatively low transition temperature of VO2, the particularly localized heating shown here, and the recently demonstrated actuation in aqueous media, these micromanipulators can be used in the different fields of bio-engineering.
Keywords :
cantilevers; electric heating; metal-insulator boundaries; micromanipulators; thin film devices; vanadium compounds; VO2; bioengineering; cantilever beam; inflection point; insulator-to-metal transition; intensity control; localized stress gradient; location control; micromanipulator; microstructure; multiple degrees of freedom; optical radiation; remote actuation; thin film;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology Materials and Devices Conference (NMDC), 2012 IEEE
Conference_Location :
Waikiki Beach, HI
Print_ISBN :
978-1-4673-2871-5
Type :
conf
DOI :
10.1109/NMDC.2012.6527573
Filename :
6527573
Link To Document :
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