DocumentCode :
2321755
Title :
Optimisation of growth parameters for photonic crystal structures
Author :
Atkinson, P. ; Johnston, M.B. ; Beere, H.E. ; Ritchie, D.A.
Author_Institution :
Cavendish Lab., Cambridge Univ., UK
fYear :
2002
fDate :
15-20 Sept. 2002
Firstpage :
153
Lastpage :
154
Abstract :
The preferential facetting that occurs during regrowth on patterned substrates by MBE, together with the different adatom migration lengths on different facets has been successfully used to provide good 1D confinement following overgrowth on mesas. However, in some instances it is preferable that the initial surface profile remains unmodified during successive growth stages. An example of this is for photonic crystal structures which can be created by patterning the surface with an array of mesas, and then regrowing a sequence of alternating layers of different refractive indices with spatially varying periodicity of order of hundreds of nanometers in both the lateral and growth directions.
Keywords :
adsorbed layers; molecular beam epitaxial growth; optical fabrication; photonic crystals; refractive index; surface topography; 1D confinement; MBE; adatom migration lengths; array; growth parameters; growth stages; mesas; optimisation; overgrowth; patterned substrates; periodicity; photonic crystal; photonic crystal structures; preferential facetting; refractive indices; regrowth; surface profile; Anisotropic magnetoresistance; Atomic layer deposition; Etching; Gallium arsenide; Hydrogen; Laboratories; Optical refraction; Photonic crystals; Surface morphology; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Molecular Beam Epitaxy, 2002 International Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-7581-5
Type :
conf
DOI :
10.1109/MBE.2002.1037805
Filename :
1037805
Link To Document :
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