DocumentCode :
2322439
Title :
Operation of an intense ion beam diode at high repetition rate
Author :
Noonan, W.A. ; Glidden, S.C. ; Greenly, J.B. ; Hammer, D.A. ; Jain ; Qi, N. ; Brissette, L.
Author_Institution :
Lab. of Plasma Studies, Cornell Univ., Ithaca, NY, USA
fYear :
1989
fDate :
0-0 1989
Firstpage :
83
Abstract :
Summary Form only given, as follows. A magnetically insulated ion diode with a plasma anode has been operated on a pulsed power system capable of up to 1-kHz repetition rate in bursts of a few pulses. The authors discuss results on diode operating characteristics as a function of anode plasma parameters and insulating magnetic field strength and results on ion beam extraction in single-shot mode. The plasma anode ion source originates as an annular puff of H/sub 2/, C/sub 2/H/sub 2/, or other gas, which is preionized and then inductively broken down by a 1- mu s-risetime magnetic field coil. The plasma is then magnetically driven toward a magnetically insulated high voltage gap. Ion diode operation depends critically on the gas puff pressure and the relative timing between initiation of the main plasma driver pulse and the arrival of the high-voltage pulse at the ion diode. Single-shot and high-repetition-rate results have been compared, and the dependence of diode operation on other diode conditions (e.g. gas puff pressure and magnetic insulation field strength) has been investigated. Anode plasma temperature and density have been measured in hydrogen plasmas using spectroscopic techniques.<>
Keywords :
ion sources; plasma diodes; 1 kHz; H/sub 2/; anode plasma parameters; diode operating characteristics; gas puff pressure; high repetition rate; high-voltage pulse; insulating magnetic field strength; intense ion beam diode; ion beam extraction; ion source; magnetic field coil; magnetically insulated ion diode; plasma anode; single-shot mode; Diodes; Ion sources; Plasma devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location :
Buffalo, NY, USA
Type :
conf
DOI :
10.1109/PLASMA.1989.166082
Filename :
166082
Link To Document :
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