DocumentCode :
2322839
Title :
Adaptable ferroelectric memories for space applications
Author :
Kamp, David A. ; DeVilbiss, Alan D. ; Philpy, S.C. ; Derbenwick, Gary F.
Author_Institution :
Celis Semicond. Corp., Colorado Springs, CO, USA
fYear :
2004
fDate :
15-17 Nov. 2004
Firstpage :
149
Lastpage :
152
Abstract :
Test results on a 1 kilobit prototype hardened-by-design ferroelectric memory show that the total dose hardness exceeds 2 Mrads and latch-up immunity exceeds 163 LET. Based on the proven prototype memory design concepts, a 2 Mbit hardened-by-design ferroelectric memory for space applications is being designed for fabrication on the 0.13 μm ferroelectric process of Texas Instruments. A subsequent chip design is expected to be at a 32 Mbit density. Using die stack packaging techniques, components at densities up to 256 Mbits based on this design may be developed. The basic ferroelectric memory core can be combined with on-chip interface circuitry to emulate any number of traditional semiconductor memory architectures, including SRAM, SDRAM, EEPROM and Flash memory, for applications ranging from small boot memories to high-density mass memories. The very fast read and write times of ferroelectric memory, coupled with the ability to trade off internal write voltage with retention and endurance, enable an adaptable ferroelectric memory technology. Texas Instrument´s design rules for ferroelectric memory processes at 0.13 μm and 0.09 μm are competitive with the most aggressive design rules used for other semiconductor memory types.
Keywords :
EPROM; SRAM chips; ferroelectric storage; radiation hardening (electronics); 0.09 micron; 0.13 micron; 1 K/bit; 32 MB; EEPROM; SDRAM; SRAM; Texas Instruments; adaptable ferroelectric memories; chip design; die stack packaging; flash memory; hardened-by-design ferroelectric memory; high-density mass memories; internal write voltage; memory endurance; memory retention; on-chip interface circuitry; semiconductor memory; small boot memories; space applications; Chip scale packaging; Circuits; Fabrication; Ferroelectric materials; Instruments; Memory architecture; Prototypes; Read-write memory; Semiconductor device packaging; Semiconductor memory;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non-Volatile Memory Technology Symposium, 2004
Print_ISBN :
0-7803-8726-0
Type :
conf
DOI :
10.1109/NVMT.2004.1380832
Filename :
1380832
Link To Document :
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