DocumentCode
2322839
Title
Adaptable ferroelectric memories for space applications
Author
Kamp, David A. ; DeVilbiss, Alan D. ; Philpy, S.C. ; Derbenwick, Gary F.
Author_Institution
Celis Semicond. Corp., Colorado Springs, CO, USA
fYear
2004
fDate
15-17 Nov. 2004
Firstpage
149
Lastpage
152
Abstract
Test results on a 1 kilobit prototype hardened-by-design ferroelectric memory show that the total dose hardness exceeds 2 Mrads and latch-up immunity exceeds 163 LET. Based on the proven prototype memory design concepts, a 2 Mbit hardened-by-design ferroelectric memory for space applications is being designed for fabrication on the 0.13 μm ferroelectric process of Texas Instruments. A subsequent chip design is expected to be at a 32 Mbit density. Using die stack packaging techniques, components at densities up to 256 Mbits based on this design may be developed. The basic ferroelectric memory core can be combined with on-chip interface circuitry to emulate any number of traditional semiconductor memory architectures, including SRAM, SDRAM, EEPROM and Flash memory, for applications ranging from small boot memories to high-density mass memories. The very fast read and write times of ferroelectric memory, coupled with the ability to trade off internal write voltage with retention and endurance, enable an adaptable ferroelectric memory technology. Texas Instrument´s design rules for ferroelectric memory processes at 0.13 μm and 0.09 μm are competitive with the most aggressive design rules used for other semiconductor memory types.
Keywords
EPROM; SRAM chips; ferroelectric storage; radiation hardening (electronics); 0.09 micron; 0.13 micron; 1 K/bit; 32 MB; EEPROM; SDRAM; SRAM; Texas Instruments; adaptable ferroelectric memories; chip design; die stack packaging; flash memory; hardened-by-design ferroelectric memory; high-density mass memories; internal write voltage; memory endurance; memory retention; on-chip interface circuitry; semiconductor memory; small boot memories; space applications; Chip scale packaging; Circuits; Fabrication; Ferroelectric materials; Instruments; Memory architecture; Prototypes; Read-write memory; Semiconductor device packaging; Semiconductor memory;
fLanguage
English
Publisher
ieee
Conference_Titel
Non-Volatile Memory Technology Symposium, 2004
Print_ISBN
0-7803-8726-0
Type
conf
DOI
10.1109/NVMT.2004.1380832
Filename
1380832
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