Title :
High power 808 nm InGaAlAs semiconductor lasers by MBE
Author :
Yi, Qu ; Baoxue, Bo ; Guojun, Liu ; Xin, Gao ; Huilin, Jiang
Author_Institution :
Nat. Key Lab. on High Power Semicond. Lasers, Changchun Univ. of Sci. & Technol., China
Abstract :
High power 808 nm semiconductor lasers become more and more important for pumping solid-state lasers, medical applications and for material processing such as welding, cutting, or surface treatment. In this paper, Indium has successfully been incorporated into AlGaAs quantum well structures such that the resulting quaternary (InAlGaAs) strained-layer lasers operate in the region of 808 nm. Such lasers were proposed as potentially more robust alternatives to AlGaAs lasers, based on expectations of the lifetime improvements. The suppression of the propagation of <100> dark-line defects (DLDS) in the InAlGaAs devices. Another improvement of lower thresholds has been realized for the devices.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; indium compounds; molecular beam epitaxial growth; quantum well lasers; surface treatment; 100 micron; 400 C; 400 micron; 50 Hz; 600 to 720 C; 808 nm; GaAs; InGaAlAs; InGaAlAs semiconductor lasers; MBE; large optical cavity laser wafers; quantum well structures; Biomedical equipment; Laser beam cutting; Laser excitation; Materials processing; Medical services; Power lasers; Pump lasers; Quantum well lasers; Semiconductor lasers; Solid lasers;
Conference_Titel :
Molecular Beam Epitaxy, 2002 International Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-7581-5
DOI :
10.1109/MBE.2002.1037900