DocumentCode
2323347
Title
Critical thickness of self-assembled Ge quantum dot superlattices
Author
Liu, J.L. ; Wan, J. ; Wang, K.L. ; Yu, D.P.
Author_Institution
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
fYear
2002
fDate
15-20 Sept. 2002
Firstpage
351
Lastpage
352
Abstract
In the recent years, there have been considerable attempts to study self-assembled multi-layered Ge quantum dot superlattices for the interest in their novel optoelectronic and thermoelectric properties as well as potential device applications. An interesting feature observed in the multi-layered dot structures was that the dots in the upper layers tended to grow on top of the buried ones, which is attributed to preferential nucleation due to an inhomogeneous strain field induced by buried dots. In this presentation, we show dot evolution characteristics in thick Ge quantum dot superlattices. The study provides strong experimental evidence of the breakdown of the vertical correlation and the growth mode change before and after the reach of the effective critical thickness of superlattices.
Keywords
elemental semiconductors; germanium; molecular beam epitaxial growth; nucleation; photoluminescence; semiconductor epitaxial layers; semiconductor quantum dots; semiconductor superlattices; transmission electron microscopy; 100 nm; 540 C; 600 C; Ge; Ge/Si bilayers; Si [100] substrates; critical thickness; inhomogeneous strain field; multi-layered dot structures; optoelectronic properties; preferential nucleation; self-assembled Ge quantum dot superlattices; thermoelectric properties; Assembly; Capacitive sensors; Electron microscopy; Nonuniform electric fields; Potential well; Quantum dots; Superlattices; Thermoelectric devices; Thermoelectricity; US Department of Transportation;
fLanguage
English
Publisher
ieee
Conference_Titel
Molecular Beam Epitaxy, 2002 International Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-7581-5
Type
conf
DOI
10.1109/MBE.2002.1037904
Filename
1037904
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