DocumentCode :
2323558
Title :
The growth of high quality heteroepitaxy ZnTe layers using low-temperature buffer
Author :
Chang, Jiho ; Godo, Kenji ; Kim, Jungjin ; Oh, Dongcheol ; Yao, Takafumi ; Lee, Changwoo
Author_Institution :
Tohoku University
fYear :
2002
fDate :
15-20 Sept. 2002
Firstpage :
377
Lastpage :
378
Abstract :
Although there have been successful demonstrations of buffer layer growth for the heteroepitaxy of large mismatched systems, however, general selection rule for the buffer layer is still unknown because the role of a buffer layer is not fully understood. In this article, heteroepitaxy ZnTe layers are grown on GaAs (001) substrates by molecular beam epitaxy (MBE). Prior to the main growth, a thin (~30nm) ZnTe buffer layer is introduced at low temperature (LT-buffer) and the effect of LT-buffer to the high temperature grown ZnTe layers have been investigated.
Keywords :
Buffer layers; Gallium arsenide; Laboratories; Molecular beam epitaxial growth; Optical films; Substrates; Temperature control; Thickness control; X-ray diffraction; Zinc compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Molecular Beam Epitaxy, 2002 International Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-7581-5
Type :
conf
DOI :
10.1109/MBE.2002.1037917
Filename :
1037917
Link To Document :
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