• DocumentCode
    2324794
  • Title

    Generation and focusing of high power ion beam in magnetically insulated diode with applied B-field

  • Author

    Bystritskii, V.M. ; Volkov, S.N. ; Krasik, Yakov E. ; Lisitsyn, I.V. ; Polkovnikova

  • Author_Institution
    Inst. of Electrophys., Sverdlovsk, USSR
  • fYear
    1989
  • fDate
    0-0 1989
  • Firstpage
    89
  • Abstract
    Summary Form only given, as follows. High-power ion beam (HPIB) generation and plasma formation processes in a magnetically insulated diode (MID) installed at a 3*10/sup 10/-W nanosecond accelerator are reported. The possibility of efficient HPIB ballistic focusing using the performed plasma in the HPIB transport region has been demonstrated. Several new diagnostics (spring pendulum and acoustic probe) were used to measure the plasma ablation pressure during the impact of the HPIB with the target. The plasma formation and its behavior in the diode gap were studied by a high-voltage probe, array of collimated Faraday cups, and streak image converter. The electron losses at the anode played the dominant role in the MID impedance behavior. The application of the active plasma source provided control of the HPIB characteristics and MID impedance behavior. The highest degree of HPIB focusing attained during the experiments with spherical-geometry diode electrodes was equal to 60. The ablation average pressures measured by spring pendulum gave several kilobars for 8-10 kA/cm/sup 2/ of HPIB density. The peak pressures attained tens of kilobars for respective HPIB current amplitudes.<>
  • Keywords
    beam handling techniques; focusing; ion beams; B-field; HPIB ballistic focusing; ablation pressure; acoustic probe; array; collimated Faraday cups; diagnostics; electron losses; focusing; generation; high power ion beam; high-voltage probe; impedance behavior; magnetically insulated diode; nanosecond accelerator; plasma formation; spherical-geometry diode electrodes; spring pendulum; streak image converter; Focusing; Ion beams; Particle beam handling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
  • Conference_Location
    Buffalo, NY, USA
  • Type

    conf

  • DOI
    10.1109/PLASMA.1989.166095
  • Filename
    166095