DocumentCode
2324794
Title
Generation and focusing of high power ion beam in magnetically insulated diode with applied B-field
Author
Bystritskii, V.M. ; Volkov, S.N. ; Krasik, Yakov E. ; Lisitsyn, I.V. ; Polkovnikova
Author_Institution
Inst. of Electrophys., Sverdlovsk, USSR
fYear
1989
fDate
0-0 1989
Firstpage
89
Abstract
Summary Form only given, as follows. High-power ion beam (HPIB) generation and plasma formation processes in a magnetically insulated diode (MID) installed at a 3*10/sup 10/-W nanosecond accelerator are reported. The possibility of efficient HPIB ballistic focusing using the performed plasma in the HPIB transport region has been demonstrated. Several new diagnostics (spring pendulum and acoustic probe) were used to measure the plasma ablation pressure during the impact of the HPIB with the target. The plasma formation and its behavior in the diode gap were studied by a high-voltage probe, array of collimated Faraday cups, and streak image converter. The electron losses at the anode played the dominant role in the MID impedance behavior. The application of the active plasma source provided control of the HPIB characteristics and MID impedance behavior. The highest degree of HPIB focusing attained during the experiments with spherical-geometry diode electrodes was equal to 60. The ablation average pressures measured by spring pendulum gave several kilobars for 8-10 kA/cm/sup 2/ of HPIB density. The peak pressures attained tens of kilobars for respective HPIB current amplitudes.<>
Keywords
beam handling techniques; focusing; ion beams; B-field; HPIB ballistic focusing; ablation pressure; acoustic probe; array; collimated Faraday cups; diagnostics; electron losses; focusing; generation; high power ion beam; high-voltage probe; impedance behavior; magnetically insulated diode; nanosecond accelerator; plasma formation; spherical-geometry diode electrodes; spring pendulum; streak image converter; Focusing; Ion beams; Particle beam handling;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location
Buffalo, NY, USA
Type
conf
DOI
10.1109/PLASMA.1989.166095
Filename
166095
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