Title :
Terahertz time-domain spectroscopy of NiOx thin films
Author :
Ha, Taewoo ; Choi, Kyujin ; Lee, Cheol Hyeok ; Lee, Kimoon ; Im, Seongil ; Kim, Jae Hoon
Author_Institution :
Dept. of Phys., Yonsei Univ., Seoul, South Korea
Abstract :
We have measured the terahertz transmittance of NiOx thin films grown on Si by thermal evaporation. The frequency-dependent conductivities were determined without resorting to a Kramers-Kronig analysis. Large changes in these spectral functions occurred due to varying deposition rate and annealing temperature. We observed a direct correlation between these parameters with the electronic and optical properties of NiOx thin films.
Keywords :
Kramers-Kronig relations; annealing; electrical conductivity; nickel compounds; silicon; terahertz wave spectra; thin films; vacuum deposition; Kramers-Kronig analysis; NiOx-Si; Si; annealing temperature; electronic properties; frequency-dependent conductivity; optical properties; spectral functions; terahertz time-domain spectroscopy; terahertz transmittance; thermal evaporation; thin films; Annealing; Conductivity; Frequency; Optical films; Optical materials; Semiconductor materials; Semiconductor thin films; Spectroscopy; Temperature; Time domain analysis;
Conference_Titel :
Infrared, Millimeter, and Terahertz Waves, 2009. IRMMW-THz 2009. 34th International Conference on
Conference_Location :
Busan
Print_ISBN :
978-1-4244-5416-7
Electronic_ISBN :
978-1-4244-5417-4
DOI :
10.1109/ICIMW.2009.5325557
