• DocumentCode
    2327121
  • Title

    100 W L-band GaAs power FP-HFET operated at 30 V

  • Author

    Sakura, N. ; Matsunaga, K. ; Ishikura, K. ; Takenaka, I. ; Asano, K. ; Iwata, N. ; Kanamori, M. ; Kuzuhara, M.

  • Author_Institution
    Kansai Electron. Res. Labs., NEC Corp., Shiga, Japan
  • Volume
    3
  • fYear
    2000
  • fDate
    11-16 June 2000
  • Firstpage
    1715
  • Abstract
    This paper reports an L-band power AlGaAs/GaAs heterostructure FET with a field-modulating plate (FP-HFET), which accomplished 100 W output power with a high power density of 1.16 W/mm at a drain bias voltage of 30 V. The developed FP-HFET is promising for achieving improved performance and reduced size of digital cellular base station systems.
  • Keywords
    Aluminium compounds; Cellular radio; Gallium arsenide; III-V semiconductors; Power field effect transistors; Semiconductor device breakdown; Semiconductor device reliability; UHF field effect transistors; 100 W; 30 V; AlGaAs-GaAs; L-band; digital cellular base station systems; drain bias voltage; field-modulating plate; heterostructure FET; output power; power FP-HFET; power density; Circuit testing; Electrodes; FETs; Gallium arsenide; L-band; Laboratories; Packaging; Passivation; Power generation; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium Digest. 2000 IEEE MTT-S International
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0149-645X
  • Print_ISBN
    0-7803-5687-X
  • Type

    conf

  • DOI
    10.1109/MWSYM.2000.862309
  • Filename
    862309