DocumentCode :
2329012
Title :
Results Of An Implant Masking Integrated Workcall In A Development Facility
Author :
Griffin, R. ; Ruey-Shan Guo ; Slama, M.
Author_Institution :
National Semiconductor Corporation
fYear :
1994
fDate :
21-22 June 1994
Firstpage :
34
Lastpage :
37
Abstract :
Effects of equipment layout on wafer fab performance are discussed. The traditional wafer fab layout is known to industrial engineers as a job shop. The strength of the job shop system is excellent process flexibility. Job shop layouts also cause long cycle times, lesser quality, and poor communication between workers. A workcell based wafer fab addresses some of those weaknesses. This paper presents initial results of the implant masking workcell in a development fab.
Keywords :
Drives; Etching; Group technology; Implants; Lithography; Manufacturing; Resists; Semiconductor thin films; Strips; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
Conference_Location :
Tokyo, Japan
Type :
conf
DOI :
10.1109/ISSM.1994.729418
Filename :
729418
Link To Document :
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