• DocumentCode
    2329012
  • Title

    Results Of An Implant Masking Integrated Workcall In A Development Facility

  • Author

    Griffin, R. ; Ruey-Shan Guo ; Slama, M.

  • Author_Institution
    National Semiconductor Corporation
  • fYear
    1994
  • fDate
    21-22 June 1994
  • Firstpage
    34
  • Lastpage
    37
  • Abstract
    Effects of equipment layout on wafer fab performance are discussed. The traditional wafer fab layout is known to industrial engineers as a job shop. The strength of the job shop system is excellent process flexibility. Job shop layouts also cause long cycle times, lesser quality, and poor communication between workers. A workcell based wafer fab addresses some of those weaknesses. This paper presents initial results of the implant masking workcell in a development fab.
  • Keywords
    Drives; Etching; Group technology; Implants; Lithography; Manufacturing; Resists; Semiconductor thin films; Strips; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
  • Conference_Location
    Tokyo, Japan
  • Type

    conf

  • DOI
    10.1109/ISSM.1994.729418
  • Filename
    729418
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2329012