Title :
Process And Device Innovations Based On Ultra Clean Technology
Author_Institution :
Tohoku University
Abstract :
Discusses the process and device innovations that are based on ultra clean technology and applications.
Keywords :
Contact resistance; Maintenance engineering; Production; Signal processing algorithms; Silicon; Technological innovation; Thermal resistance; Thermal stresses; Threshold voltage; Ultra large scale integration;
Conference_Titel :
Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
Conference_Location :
Tokyo, Japan
DOI :
10.1109/ISSM.1994.729427
