DocumentCode
2329377
Title
Particle-Growth Caused By Film Deposition In VLSI Manufacturing Process
Author
Takii, Y. ; Miyoshi, Yasuyuki ; Horofuji, Y.
Author_Institution
Matsushita Electric Industrial Co.,Ltd.
fYear
1994
fDate
21-22 June 1994
Firstpage
107
Lastpage
110
Abstract
A new method for forming imaginary-particles with various sizes and materials was developed, and particle growth caused by film deposition in VLSI manufacturing process was investigated by using imaginary-particles. Consequently, particle growth was strongly dependent on film thickness and step-coverage decided by film deposition method, and the study with imaginary-particles was very effective to explicate the particle growth mechanism.
Keywords
Artificial intelligence; Lithography; Manufacturing industries; Manufacturing processes; Plasma applications; Productivity; Semiconductor films; Semiconductor materials; Size control; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
Conference_Location
Tokyo, Japan
Type
conf
DOI
10.1109/ISSM.1994.729433
Filename
729433
Link To Document