Title :
Reducing Electrostatic Related Defects In Photolithography
Author_Institution :
Ion Systems Inc.
Abstract :
Failure to control static charge creates problems in a variety of cleanroom environments. This is particularly apparent in photolithography areas where both the product wafers and the reticles are at risk to the effects of static charge. This paper presents an introduction to static charge control in photolithography areas and the use of air ionization for this purpose.
Keywords :
Conducting materials; Control systems; Electrons; Electrostatic discharge; Filtration; Lithography; Production equipment; Surface charging; Surface discharges; Systems engineering and theory;
Conference_Titel :
Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
Conference_Location :
Tokyo, Japan
DOI :
10.1109/ISSM.1994.729449
