• DocumentCode
    2329639
  • Title

    Reducing Electrostatic Related Defects In Photolithography

  • Author

    Steinman, A.

  • Author_Institution
    Ion Systems Inc.
  • fYear
    1994
  • fDate
    21-22 June 1994
  • Firstpage
    179
  • Lastpage
    182
  • Abstract
    Failure to control static charge creates problems in a variety of cleanroom environments. This is particularly apparent in photolithography areas where both the product wafers and the reticles are at risk to the effects of static charge. This paper presents an introduction to static charge control in photolithography areas and the use of air ionization for this purpose.
  • Keywords
    Conducting materials; Control systems; Electrons; Electrostatic discharge; Filtration; Lithography; Production equipment; Surface charging; Surface discharges; Systems engineering and theory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
  • Conference_Location
    Tokyo, Japan
  • Type

    conf

  • DOI
    10.1109/ISSM.1994.729449
  • Filename
    729449
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2329639