Title :
Yield Enhancement Of An Advanced Poly-Emitter Complementary Bipolar Technology
Author :
Lopez-Serrano, J. ; Song W.Koh ; Crandell, T.L. ; Delgado, J.A. ; Nicolay, H.C. ; Haycock, T.L. ; Strojwas, A.J.
Author_Institution :
Carnegie Mellon University
Abstract :
This paper presents a methodology for the enhancement of VLSI process manufacturability with TCAD tools. Once the fabrication equipment fluctuations are characterized, Monte Carlo simulations and sensitivity analyses are used to design corrective actions that minimize process variability, thus improving the manufacturability. This approach was successfully implemented in an advanced bipolar technology at Harris, resulting in a 15% improvement in yield.
Keywords :
Electrical resistance measurement; Etching; Fluctuations; Fluid flow; Furnaces; Integrated circuit yield; Manufacturing processes; Pulp manufacturing; Semiconductor device manufacture; Sensitivity analysis;
Conference_Titel :
Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
Conference_Location :
Tokyo, Japan
DOI :
10.1109/ISSM.1994.729450
