DocumentCode
2329748
Title
Automated In-line Monitoring Of Chemical Assay In Wafer Cleaning Solution
Author
Takaiwa, S. ; Funabashi, T. ; Yoshii, A. ; Iwata, T.
Author_Institution
TOKICO Ltd.
fYear
1994
fDate
21-22 June 1994
Firstpage
194
Lastpage
197
Abstract
The continuous monitoring equipment for the chemical assay of these cleaning solution has been developed. These assay are determined by the electrochemical sensing probes such called as ion selective electrodes. With this method, it is able to measure the concentration of components in the solution by the sensitivity of 0. 1 -1 g/L.
Keywords
Chemical processes; Chemical sensors; Cleaning; Computerized monitoring; Electrodes; Large scale integration; Manufacturing processes; Probes; Random access memory; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
Conference_Location
Tokyo, Japan
Type
conf
DOI
10.1109/ISSM.1994.729453
Filename
729453
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