DocumentCode
2332448
Title
Design, fabrication, and performance analysis of MEMS mirror with sidewall electrodes
Author
Bai, Yanhui ; Yeow, John T W ; Wilson, Brian C.
Author_Institution
Dept. of Syst. Design Eng., Univ. of Waterloo, Waterloo, ON, Canada
fYear
2009
fDate
21-23 Sept. 2009
Firstpage
179
Lastpage
184
Abstract
A novel 2 Degree-of-Freedom (DOF) micro-electro-mechanical systems (MEMS) mirror with sidewall electrodes is presented. The paper analyzes the effects of the serpentine torsion bar width, and bottom electrodes and sidewall electrodes on the performance of the mirror. A new fabrication process based on silicon-on-insulator (SOI) wafer and a high aspect-ratio shadow mask is presented. In comparison to the previous fabrication process and the Optical iMEMS process, the presented process is novel, simple and easy to be realized. Static and dynamic experiments indicate MEMS mirror with sidewall electrodes can realize the large scanning angle under low drive voltage. This mirror is well-suited for application where large linear angular scan at a low driving voltage is required.
Keywords
electrodes; micromirrors; optical design techniques; optical fabrication; MEMS mirror; bottom electrodes; high aspect-ratio shadow mask; micro-electro-mechanical systems mirror; micromirror; optical iMEMS process; serpentine torsion bar width; sidewall electrodes; silicon-on-insulator wafer; Biomedical electrodes; Electrostatic actuators; Low voltage; Micromachining; Micromechanical devices; Micromirrors; Mirrors; Optical device fabrication; Performance analysis; Piezoelectric actuators; SOI; mask; micromirror; serpentine; sidewall;
fLanguage
English
Publisher
ieee
Conference_Titel
Optomechatronic Technologies, 2009. ISOT 2009. International Symposium on
Conference_Location
Istanbul
Print_ISBN
978-1-4244-4209-6
Electronic_ISBN
978-1-4244-4210-2
Type
conf
DOI
10.1109/ISOT.2009.5326120
Filename
5326120
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