DocumentCode :
2332473
Title :
Monte Carlo simulation of photoexcited carriers in InAs thin films
Author :
Nakamura, Kenji ; Mori, Nobuya
Author_Institution :
Grad. Sch. of Eng., Osaka Univ., Suita, Japan
fYear :
2012
fDate :
9-11 May 2012
Firstpage :
1
Lastpage :
2
Abstract :
We have performed Monte Carlo simulation of photoexcited carriers in InAs thin films to investigate effects of the film thickness on the carrier dynamics. We find that the peak value of the time derivative of the current increases (decreases) as the film thickness decreases when the thickness is less than ~200 nm, under the boundary condition that only holes (both electrons and holes) are confined in the film.
Keywords :
III-V semiconductors; Monte Carlo methods; indium compounds; photoexcitation; thin film circuits; InAs; Monte Carlo simulation; carrier dynamics; film thickness; photoexcited carrier; thin film; Charge carrier processes; Laser beams; Laser excitation; Monte Carlo methods; Substrates; Surface emitting lasers; Time factors; InAs; Monte Carlo Simulation; THz;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Future of Electron Devices, Kansai (IMFEDK), 2012 IEEE International Meeting for
Conference_Location :
Osaka
Print_ISBN :
978-1-4673-0837-3
Type :
conf
DOI :
10.1109/IMFEDK.2012.6218606
Filename :
6218606
Link To Document :
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