DocumentCode
2332651
Title
Hydrogen sensor based on Schottky barriers of Pd/GeO2 using a low cost electrochemically deposited thin GeO2 film
Author
Jawad, M.J. ; Hashim, M.R. ; Ali, N.K.
Author_Institution
Sch. of Phys., Univ. Sains Malaysia, Minden, Malaysia
fYear
2010
fDate
1-3 Dec. 2010
Firstpage
1
Lastpage
2
Abstract
Conductometric semi-conducting metal oxide gas sensors have been widely used and investigated in the detection of gases. They have attracted much attention in the field of gas sensing under atmospheric conditions due to their low cost and flexibility in production, simplicity of their use, and large number of detectable gases. One of such materials is (GeO2) [1]. In this work, we present a method of synthesis of sub micro-sized germanium dioxide (GeO2) on porous silicon (PS) by electrochemical deposition. An n-type Si (100) wafer was used to fabricate (PS) where PS was electrochemically anodized in HF based electrolyte, at current density of 50 mA/cm2 for 30 min. In the mean time pure GeO2 is produced through hydrolization of GeCl4 by hydrogen peroxide and then electrochemically deposited on PS. Palladium (Pd) is deposited on the GeO2 /PS using RF sputtering technique to produce Schottky contact. The grown GeO2 crystals were characterized using SEM, EDX, (Fig. 1). Corresponding I-V (Fig. 2) characteristics of the Schottky diodes were measured for different flow rates of hydrogen gas. Thermionic emission model was used to analysis I-V data. The barrier height could be seen to increase significantly with hydrogen flow rate. Sensitivity and response time of the sensor will be discussed.
Keywords
Schottky barriers; X-ray chemical analysis; anodisation; gas sensors; germanium compounds; hydrogen; interface structure; palladium; porous semiconductors; scanning electron microscopy; semiconductor-metal boundaries; thermionic emission; EDX; GeCl4 hydrolization; GeO2 crystal growth; GeO2-Si; H2; HF based electrolyte; Pd-GeO2; RF sputtering technique; SEM; Schottky barriers; Schottky contact; Si; conductometric semiconducting metal oxide gas sensors; electrochemical anodization; electrochemical deposition; gas detection; hydrogen gas flow rates; hydrogen peroxide; hydrogen sensor; n-type Si (100) wafer; porous silicon fabrication; sensor response time; submicrosized germanium dioxide synthesis; thermionic emission model; thin GeO2 film; time 30 min;
fLanguage
English
Publisher
ieee
Conference_Titel
Enabling Science and Nanotechnology (ESciNano), 2010 International Conference on
Conference_Location
Kuala Lumpur
Print_ISBN
978-1-4244-8853-7
Type
conf
DOI
10.1109/ESCINANO.2010.5700993
Filename
5700993
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