DocumentCode :
233338
Title :
Gate misalignment evaluation method for commercial MOS trapezoidal gate transistors
Author :
Sabbadin, D.S. ; Giacomini, R.C.
Author_Institution :
Dept. of Electr. Eng., FEI, Sao Bernardo, Brazil
fYear :
2014
fDate :
2-4 April 2014
Firstpage :
1
Lastpage :
5
Abstract :
This work addresses the effect of gate misalignment on the electrical characteristics of MOSFET structures with trapezoidal gate shapes. Differential Triangular test structure are used for the extraction of misalignments between gate and the other transistor structures, as a function of the differences in drain currents. Three-dimensional numerical simulation was used for comparison and verification of measurements. These simulations and measurements show how the analytical model developed fits properly to designed structures.
Keywords :
MOSFET; numerical analysis; semiconductor device models; semiconductor device testing; MOSFET structures; analytical model; commercial MOS trapezoidal gate transistors; differential triangular test structure; drain currents; electrical characteristics; gate misalignment evaluation method; three-dimensional numerical simulation; trapezoidal gate shapes; Analytical models; Current measurement; Integrated circuit modeling; Logic gates; MOSFET; Silicon-on-insulator; Gate Misalignment; Trapezoidal Gate;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Devices, Circuits and Systems (ICCDCS), 2014 International Caribbean Conference on
Conference_Location :
Playa del Carmen
Print_ISBN :
978-1-4799-4684-6
Type :
conf
DOI :
10.1109/ICCDCS.2014.7016172
Filename :
7016172
Link To Document :
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