Effect of annealing process on ZnO nanorod prepared at different potentials using electrodeposition technique

This paper carried out to investigate the different potentials due to annealing temperatures. The potentials range from -1.0 to -1.4V were deposited with electrochemical deposition technique that consist three electrode used. There was known as Indium tin-oxide (ITO) glass, Platinum (Pt) and Silver chloride (Ag/AgCl) which were act working, counter and reference electrode, respectively. The solutions was prepared known as electrolytes which has diluted together before deposition process. Cyclic voltammetry was used to determine the applied potentials for deposited ZnO films and chronoamprometry graph for investigating current-time deposition process.The characterisations were done to identify the ZnO nanostructured on ITO-glass. The surface morphology of ZnO film was observed by using field emission scanning electron microscopy (FESEM). The roughness of ZnO films were investigated by measuring using Surface Profiler and the result shown that became less roughness at high potentials. The optical properties is also investigated to determine the band gap of ZnO film for sensor applications.