DocumentCode :
2333562
Title :
TSV based 3D stacked ICs: Opportunities and challenges
Author :
Hamdioui, Said
Author_Institution :
Delft Univ. of Technol., Delft, Netherlands
fYear :
2012
fDate :
18-20 April 2012
Firstpage :
2
Lastpage :
2
Abstract :
The industry is preparing itself for three-dimensional stacked ICs (3D-SICs), vertically interconnected by means of Through-Silicon Via´s (TSVs). 3D-SIC is an emerging technology that promises huge advantages such as heterogeneous integration with higher performance and lower power dissipation at a smaller footprint. However, for 3D integration to become a viable product approach, many challenges have to be solved including design, manufacturing and test. This talk will provide first an overview about the opportunities and challenges of 3D-SICs. Thereafter, some major challenges such as yield improvement, reliability and test cost reduction will be addressed in more details. Compound yield is a major concern for Wafer-to-Wafer 3D stacking (used for e.g. dies with similar size such as memories), especially for higher number stacked dies. Reliability is another concerns that may be caused due to wafer thinning, TSV processing, thermal and mechanical stress, etc. Finally, 3D-SIC test needs complex test flow trade-offs due to e.g. huge different test moments (e.g., pre-bond test, mid-bond test, final test).
Keywords :
three-dimensional integrated circuits; 3D integration; 3D stacked IC; 3D-SIC test; TSV processing; heterogeneous integration; mechanical stress; thermal stress; three-dimensional stacked; through silicon via; viable product; wafer thinning; wafer-to-wafer 3D stacking;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design and Diagnostics of Electronic Circuits & Systems (DDECS), 2012 IEEE 15th International Symposium on
Conference_Location :
Tallinn
Print_ISBN :
978-1-4673-1187-8
Electronic_ISBN :
978-1-4673-1186-1
Type :
conf
DOI :
10.1109/DDECS.2012.6219008
Filename :
6219008
Link To Document :
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