DocumentCode :
2333755
Title :
Morphology and particle size analysis on Al/Ni binary catalyst for carbon nanotube growth through plasma enhanced chemical vapour deposition
Author :
Yee, Lee Wai ; Sin, Tan Kai ; Mun, Soong Wai ; Saman, Rahimah Mohd
Author_Institution :
Nanoelectron. Lab., Mimos Berhad, Kuala Lumpur, Malaysia
fYear :
2010
fDate :
1-3 Dec. 2010
Firstpage :
1
Lastpage :
2
Abstract :
The growing mechanism of the CNT and the correlation between the diameters of the CNT to the particle size of the catalyst and the effect of an Al buffer layer between the active catalyst material Ni on the growth of CNT using PECVD had been studied. Using a thin layer of Al as a buffer layer between active catalyst material does produce a higher density of catalyst particles as compared to the one without Al buffer layer. However, for an increasing Al thickness with our current setup, it was observed that there is a decreasing catalytic activity. The investigation of the effect of Al/Ni binary catalyst particle distribution using Grazing Incidence Small Angle X-ray Scattering (GISAXS) is also reported.
Keywords :
X-ray scattering; aluminium; buffer layers; carbon nanotubes; catalysis; catalysts; nanofabrication; nickel; particle size; plasma CVD; Al-Ni; C; GISAXS; PECVD; active catalyst; binary catalyst; buffer layer; carbon nanotube growth; grazing incidence small angle X-ray scattering; morphology; particle distribution; particle size; plasma enhanced chemical vapour deposition; thin layer;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Enabling Science and Nanotechnology (ESciNano), 2010 International Conference on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-4244-8853-7
Type :
conf
DOI :
10.1109/ESCINANO.2010.5701054
Filename :
5701054
Link To Document :
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