Title :
VLSI circuits degradation due to ESD stress below ESD rating voltage
Author :
Lisenker-Touber, Boris
Author_Institution :
Tower Semicond. Ltd., Migdal Haemek, Israel
Abstract :
This paper examines low level damage due to ESD stress below ESD rating on one-micron n-well CMOS VLSI circuits and on an NMOSFET. Different VLSI products with different ESD protection circuits were tested using a new method, proposed for latency phenomenon investigation. It is clearly ascertained that ESD stress below ESD rating causes latency damage in VLSI circuits independent of the ESD protection circuit performance. The results obtained on an NMOSFET allow to explain many in-circuits degradations caused by low-level ESD events.
Keywords :
CMOS integrated circuits; MOSFET; VLSI; electrostatic discharge; failure analysis; integrated circuit reliability; integrated circuit testing; protection; ESD protection circuits; ESD rating voltage; ESD stress; NMOSFET; VLSI circuits degradation; low level damage; n-well CMOS VLSI circuits; Circuit testing; Degradation; Delay; Dielectric substrates; Electrostatic discharge; MOSFET circuits; Protection; Stress; Very large scale integration; Voltage;
Conference_Titel :
Electrical and Electronics Engineers in Israel, 1995., Eighteenth Convention of
Conference_Location :
Tel Aviv, Israel
Print_ISBN :
0-7803-2498-6
DOI :
10.1109/EEIS.1995.513838