DocumentCode
2336010
Title
Neutral accumulation from plasma-wall interactions in plasma opening switches
Author
Chen, L.L. ; Geary
Author_Institution
Berkeley Res. Associates, Springfield, VA, USA
fYear
1989
fDate
0-0 1989
Firstpage
123
Abstract
Summary Form only given, as follows. The effects of contaminants on the electrodes of plasma opening switches have been studied. The contaminants introduce backscattered and sputtered neutral atoms into the carbon plasma that is impinging on the cathode. The process has been investigated with the TRIM.SP code. The distribution of density of these neutral atoms from the cathode surface has been obtained and found to be substantial compared to the density of the incident carbon plasma. The dependence of the sputtering yield on the composition of the contaminants has also been studied.<>
Keywords
cathodes; plasma switches; plasma-wall interactions; TRIM.SP code; backscattering; cathode surface; contaminants; plasma opening switches; plasma-wall interactions; sputtered neutral atoms; sputtering yield; Cathodes;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location
Buffalo, NY, USA
Type
conf
DOI
10.1109/PLASMA.1989.166188
Filename
166188
Link To Document