DocumentCode :
2339920
Title :
Plasma emission and absorption spectroscopy with an optical fiber probe
Author :
Jin, Z.J. ; Chan, Chi Hou
Author_Institution :
Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA
fYear :
1989
fDate :
0-0 1989
Firstpage :
141
Abstract :
Summary Form only given, as follows. An optical-fiber probe has been used to measure the emission and absorption coefficients of a parallel-plate RF plasma. The probe, made of crofon, is inserted into a glass tube filled with air at atmospheric pressures in order to prevent the initiation of a discharge by the RF capacitively coupled inside the tube. The probe end of the glass tube is designed as a half-lens for focusing. The advantage of the probe is its capability to make localized measurements, allowing three-dimensional mapping of the emission and absorption properties of the plasma. The experiments were carried out in a parallel-plate reactor which was used for sputtering Y-Ba-Cu-O superconducting thin films. Measurement of an RF glow discharge with an electron density approximately=10/sup 10/-10/sup 11/ cm/sup -3/, electron temperature approximately=1.0 eV, neutral pressure approximately=115 mtorr, and RF power of 30 W at a frequency of 500 kHz gave values of alpha =2.2*10/sup -2/ cm/sup -1/ and epsilon =9.2*10/sup 6/ for lambda =6166 AA. Theoretical calculations indicate that the absorption coefficient of the bremsstrahlung radiation is much less than the measured alpha value.<>
Keywords :
fibre optic sensors; plasma probes; Y-Ba-Cu-O; absorption coefficients; absorption spectroscopy; atmospheric pressures; bremsstrahlung radiation; capacitative coupling; crofon; electron density; electron temperature; focusing; glass tube; glow discharge; half-lens; initiation; localized measurements; neutral pressure; optical fiber probe; parallel-plate RF plasma; parallel-plate reactor; plasma emission; sputtering Y-Ba-Cu-O superconducting thin films; three-dimensional mapping; Optical fiber transducers; Plasma measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location :
Buffalo, NY, USA
Type :
conf
DOI :
10.1109/PLASMA.1989.166231
Filename :
166231
Link To Document :
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